According to South Korean media, Samsung is planning to introduce its first High-NA EUV (Extreme Ultraviolet) lithography system, the 'EXE:5000', by the end of this year or in the first quarter of 2025. ASML, the sole manufacturer of such equipment, has produced only eight EXE:5000 units to date, with several already pre-ordered by Intel. The installation process for High-NA EUV, which handles 13.5nm wavelength EUV light, is notably intricate and time-consuming. Even if Samsung manages to introduce the High-NA EUV equipment by year-end, it is anticipated that the setup and calibration will take a considerable amount of time, with actual wafer production only expected to commence in the first half of 2025.

Furthermore, Samsung is collaborating with Japanese equipment manufacturer Lasertech to develop High-NA reticle inspection equipment. The use of High-NA EUV for semiconductor reticle inspection is said to improve contrast by over 30% compared to existing EUV technology.

In preparation for the commercial application of High-NA EUV technology by 2027, Samsung is actively partnering with companies such as Synopsys, JSR (a Japanese photoresist manufacturer), and Tokyo Electron. These collaborations aim to advance the ecosystem surrounding High-NA EUV technology, which is poised to redefine the standards in semiconductor manufacturing.